Fillable forms for a deposition

JOURNALDE PHYSIQUE IV colloque C5, supplkment au Journal de Physique II, Volume 5 , juin 1995 Modelling of Precursor Flow and Deposition in Atomic Layer Deposition Reactor H. Siimon and J. Aarik Universityof Tartu, Institute of Experimental Physics and Technology, l i k o o l18, EE2400 Tartu, Estonia i Abstract. A calculalion modcl to study alornic layer dcposifiorl (A1,I)) in low-pressure charinel-type CVI)...
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