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US 20070224521A1 (19) United States (12) Patent Application Publication (10) Pub. No.: US 2007/0224521 A1 (43) Pub. Date: Kurosawa (54) PHOTOS FOR FORMING A RESIST Publication Class?cation PATTERN
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What is photomask for forming a?
A photomask for forming a is a tool used in the semiconductor manufacturing process to transfer circuit patterns onto the surface of a wafer.
Who is required to file photomask for forming a?
The company or entity involved in the semiconductor manufacturing process is usually responsible for filing the photomask for forming a.
How to fill out photomask for forming a?
Filling out a photomask for forming a involves providing information such as circuit pattern specifications, wafer size, and any special requirements or instructions.
What is the purpose of photomask for forming a?
The purpose of a photomask for forming a is to accurately transfer circuit patterns onto the wafer surface, enabling the creation of semiconductor devices.
What information must be reported on photomask for forming a?
Information that must be reported on a photomask for forming a includes circuit pattern specifications, wafer size, and any special requirements or instructions needed for the manufacturing process.
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