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Selective Resputtering-Induced Magnetic Anisotropy in High-Density Magneto optic Media V.G. Harris1 and T. Pokhil2 Naval Research Laboratory, 2Seagate Technology 1 Amorphous rare earth-transition
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How to fill out selective resputtering-induced magnetic anisotropy:

01
Firstly, identify the specific material or surface where you want to induce magnetic anisotropy through selective resputtering. This could be a thin film, a substrate, or any other relevant component.
02
Determine the desired orientation or alignment of the induced magnetic anisotropy. This may involve considering the specific application or purpose for which the anisotropy is required.
03
Familiarize yourself with the principles and techniques of selective resputtering. This involves the process of bombarding the surface with ions to selectively remove atoms or molecules, thereby modifying its properties.
04
Design a plan or recipe for the selective resputtering process, taking into account parameters such as ion energy, ion type, angle of incidence, and duration of bombardment. These parameters will influence the induced magnetic anisotropy.
05
Prepare the necessary equipment and tools for the selective resputtering process. This may include a vacuum chamber, ion source, target material, and suitable measurement or characterization techniques.
06
Follow the plan or recipe to execute the selective resputtering process. Ensure that the chosen parameters are properly set and controlled throughout the process.
07
Monitor and measure the induced magnetic anisotropy during or after the selective resputtering process using appropriate characterization techniques. This will help to verify whether the desired anisotropy has been achieved.
08
Adjust or refine the process if necessary, based on the measured results. This may involve revisiting certain parameters or making changes to the plan.

Who needs selective resputtering-induced magnetic anisotropy:

01
Researchers and scientists working in the field of materials science and engineering, particularly those studying magnetic properties and their applications.
02
Industries involved in the development and production of magnetic devices or structures, such as magnetic sensors, data storage devices, or magnetic memory technologies.
03
Academic institutions or research centers conducting studies on magnetic anisotropy and its impact on material properties and performance.
04
Innovators and inventors seeking to explore new applications or technologies that rely on controlled magnetic anisotropy, as it can offer advantages in various fields, including electronics, energy, and telecommunications.
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Selective resputtering-induced magnetic anisotropy is a phenomenon where the magnetic anisotropy of a material is enhanced through the process of selective resputtering, which involves bombarding the material's surface with energetic ions and removing some of its atoms.
There is no specific requirement to file selective resputtering-induced magnetic anisotropy. It is primarily a scientific concept and not a filing or reporting requirement.
Selective resputtering-induced magnetic anisotropy does not require any specific form or document to be filled out. It is a scientific concept that is studied and analyzed through experimental techniques and calculations.
The purpose of studying selective resputtering-induced magnetic anisotropy is to better understand the behavior and properties of magnetic materials. This knowledge can be used in various scientific and technological applications, such as designing more efficient magnetic storage devices or improving magnetic sensors.
Selective resputtering-induced magnetic anisotropy does not require any specific information to be reported. It is a scientific concept that is studied and analyzed through experimental techniques and calculations.
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