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Notice Inviting Quotation (Procurement mode)
INDIAN INSTITUTE OF TECHNOLOGY DELHI
HAUL HAS, NEW DELHI110016
Dated: 02/02/2017
Open Tender Notice No. IIT/BEEN(SP863)/2017
Indian Institute of Technology
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What is plasma-enhanced atomic layer deposition?
Plasma-enhanced atomic layer deposition is a thin film deposition technique that uses plasma to enhance the process of depositing layers of materials onto a substrate in a controlled and precise manner.
Who is required to file plasma-enhanced atomic layer deposition?
Companies or individuals utilizing plasma-enhanced atomic layer deposition in their manufacturing processes are required to file the necessary documentation.
How to fill out plasma-enhanced atomic layer deposition?
Plasma-enhanced atomic layer deposition forms can be filled out by providing information about the materials being deposited, the process parameters, and any safety precautions taken.
What is the purpose of plasma-enhanced atomic layer deposition?
The purpose of plasma-enhanced atomic layer deposition is to create thin films with precise thickness and composition for use in various applications such as semiconductors, solar cells, and microelectronics.
What information must be reported on plasma-enhanced atomic layer deposition?
Information such as the type of materials being deposited, process parameters, equipment used, and any safety measures taken must be reported on plasma-enhanced atomic layer deposition forms.
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