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Application in a system for extreme ultraviolet (EU), scattering with aperture limited ..... 12b: Summary Report on Stencil Mask Modeling, September 30, 1999 ...
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What is advanced mask modeling accuracy?
Advanced mask modeling accuracy refers to the level of accuracy achieved in modeling a mask used in the manufacturing of integrated circuits. It is a measure of how closely the modeled mask matches the physical mask, taking into account factors like optical effects and process variations.
Who is required to file advanced mask modeling accuracy?
The entities involved in the manufacturing of integrated circuits, such as semiconductor companies and mask manufacturers, are typically required to file advanced mask modeling accuracy reports.
How to fill out advanced mask modeling accuracy?
Filling out advanced mask modeling accuracy involves collecting data on the modeled mask and comparing it to the physical mask. This includes measuring critical dimensions, evaluating optical proximity effects, and accounting for process variations. The specific process for filling out the report may vary depending on the regulatory requirements and industry standards.
What is the purpose of advanced mask modeling accuracy?
The purpose of advanced mask modeling accuracy is to ensure the quality and reliability of integrated circuits. By accurately modeling the mask used in the manufacturing process, semiconductor companies can optimize their designs and manufacturing processes, leading to improved product performance and yield.
What information must be reported on advanced mask modeling accuracy?
The information reported on advanced mask modeling accuracy typically includes data on critical dimensions, optical proximity effects, process variations, and the level of accuracy achieved in modeling the mask. This may also include details on the modeling techniques and tools used.
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