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NOTICE INVITING TENDER Inquiry FOR SUPPLY & INSTALLATION OF RF/DC MAGNETRON SPUTTERING UNIT FOR DEPARTMENT OF MATERIALS SCIENCETender No.201920/09 Date of Issue: 27.08.2019 Date of closing: 17.09.2019Central
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01
Clean the target surface thoroughly to ensure proper adhesion and uniform film deposition.
02
Place the substrate material in position inside the vacuum chamber.
03
Connect the RFDC power supply to the magnetron sputtering system.
04
Set the desired RF power and frequency for the process.
05
Initiate the sputtering process by applying RF power to the target material.
06
Monitor the deposition rate and adjust parameters as needed for optimal film quality.
07
Once the desired film thickness is achieved, stop the sputtering process and vent the chamber to retrieve the substrate.
Who needs of rfdc magnetron sputtering?
01
Researchers and scientists in the field of thin film deposition for various applications such as electronics, optics, and coatings.
02
Manufacturers of semiconductors, solar cells, and other high-tech devices requiring precise thin film coatings.
03
Companies conducting research and development in advanced materials and surface engineering.
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What is of rfdc magnetron sputtering?
RFDC magnetron sputtering is a technique used for depositing thin films on substrates by sputtering a target material using a radio frequency (RF) power source and a direct current (DC) power source simultaneously.
Who is required to file of rfdc magnetron sputtering?
Researchers, scientists, and engineers working in the field of thin film deposition are typically required to file information on RFDC magnetron sputtering.
How to fill out of rfdc magnetron sputtering?
To fill out information on RFDC magnetron sputtering, one must provide details on the target material, deposition conditions, sputtering power, and any other relevant parameters.
What is the purpose of of rfdc magnetron sputtering?
The purpose of RFDC magnetron sputtering is to create thin films with specific properties such as thickness, composition, and structure for various applications.
What information must be reported on of rfdc magnetron sputtering?
The information that must be reported on RFDC magnetron sputtering includes the target material, deposition parameters, film properties, and any relevant experimental results.
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