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Online Bids (through Procurement Portal of PPP)are invited magnetron Sputtering at IIT(BHU) Varanasi Tender No.: IIT(BHU)/Chemical Egg./RTU/DST/01/202324/22 Tender date: 02012024 Last Date of Submission:
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01
Ensure all safety precautions are followed before starting the process.
02
Load the sample substrate onto the holder in the sputtering chamber.
03
Evacuate the chamber to low vacuum levels.
04
Introduce the sputtering gas into the chamber at the desired flow rate.
05
Power on the RF power supply to activate the sputtering process.
06
Monitor the deposition progress and adjust parameters as needed.
07
Once the desired film thickness is achieved, turn off the RF power supply and vent the chamber back to atmospheric pressure.
08
Carefully remove the sample substrate from the chamber and analyze the deposited film.

Who needs magnetron sputtering at iitbhu?

01
Researchers working on thin film deposition techniques.
02
Scientists studying material properties at nano-scale.
03
Engineers developing advanced electronic devices.
04
Students conducting research projects in surface coating technologies.
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Magnetron sputtering at IIT BHU is a physical vapor deposition technique used to deposit thin films of materials onto various substrates by using a magnetron to generate a plasma.
Researchers and students who are conducting experiments that involve the use of magnetron sputtering equipment at IIT BHU are required to file for its usage.
To fill out magnetron sputtering at IIT BHU, one must complete the designated application form, provide details of the experiment, and submit it to the appropriate department or lab coordinator.
The purpose of magnetron sputtering at IIT BHU is to create high-quality thin films for various applications in electronics, materials science, and nanotechnology.
The information that must be reported includes the type of materials used, the parameters of the sputtering process, purpose of the deposition, and safety considerations.
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