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18th Fraunhofer IASB Lithography Simulation Workshop
May 25 27, 2023, Behringersmhle, GermanyProgram
Thursday, May 25
6:00 pm: Welcome reception
8:00 8:15 pm: Welcome and introduction, Andreas Erdman
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How to fill out computational lithography and optics
How to fill out computational lithography and optics
01
Gather necessary information such as the design layout and specifications.
02
Use computational software such as software for mask optimization or inverse lithography to simulate the lithography process.
03
Adjust parameters and settings in the software to optimize the process for desired outcomes.
04
Analyze the results and make any necessary adjustments.
05
Repeat the simulation and analysis process until the desired results are achieved.
06
Use the optimized settings to guide the actual lithography process.
Who needs computational lithography and optics?
01
Semiconductor manufacturing companies
02
Optical engineers and researchers
03
Photolithography equipment manufacturers
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What is computational lithography and optics?
Computational lithography and optics is the use of mathematical algorithms and optical systems to improve the resolution and quality of lithographic processes in semiconductor manufacturing.
Who is required to file computational lithography and optics?
Companies or individuals involved in semiconductor manufacturing and lithographic processes are required to file computational lithography and optics.
How to fill out computational lithography and optics?
To fill out computational lithography and optics, one must provide detailed information about the mathematical algorithms and optical systems used in lithographic processes.
What is the purpose of computational lithography and optics?
The purpose of computational lithography and optics is to enhance the resolution and quality of lithographic processes in semiconductor manufacturing.
What information must be reported on computational lithography and optics?
Information such as the algorithms used, optical systems implemented, and results of the lithographic processes must be reported on computational lithography and optics.
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