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UC Santa Barbara UC Santa Barbara Electronic Theses and Dissertations Title Design, Fabrication and Characterization of Highly Linear NPolar GaN MISHEMT for mmWave Receiver ApplicationsPermalink https://escholarship.org/uc/item/59t9n4ntAuthor
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How to fill out n-polar gan deep recess
How to fill out n-polar gan deep recess
01
Begin by selecting appropriate n-polar GaN wafers.
02
Clean the wafers thoroughly to remove any contaminants.
03
Use photolithography to define the deep recess areas on the wafer.
04
Etch the defined areas using suitable etching techniques, such as reactive ion etching (RIE).
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Perform a detailed inspection of the etched recess to ensure uniformity and precision.
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Deposit additional layers as necessary, ensuring compatibility with the n-polar GaN material.
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Conduct electrical and structural testing of the completed recess to verify performance.
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Researchers and scientists working in the field of semiconductor devices.
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Semiconductor manufacturers producing high-power and high-frequency devices.
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Engineers involved in designing and fabricating electronic components using n-polar GaN.
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